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INTRODUCTION
 | The
Clean Room facility of CNM-IMB is especially well suited for R+D+i
projects due to the flexibility of its processes. The installed equipments and
the large experience and expertise of its staff guarantees the silicon device
processing and characterisation steps. |
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spite of this flexibility, the organisation, management and procedures of use
are well established and can be considered as quasi-industrial. These procedures
ensure the process quality in terms of reliability and repetitiveness that are
of vital importance for training and research purposes. |  |
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available Clean Room technologies are well established technologies and
not mere processes linked together; thus, reproducible results are obtained with
production yield and reliability similar to the industrial ones. Another remarkable
point deals with the completeness of processes offered which makes feasible the
existence of operative technologies, from the device design to their encapsulation
and test, passing through the fabrication process (back-end and front-end processes). |
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the Clean Room facilities a Nanofabrication Laboratory has been
arranged. The objective of this laboratory is to integrate the nanolithography
tools with other technological processes available at CNM-IMB for fabricating
nanostructures, nanodevices and nanosystems |  |
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Microsystems Laboratory, specially designed to settle the silicon micromechanization
techniques and the required characterization tools, makes the appropiate technologies
for the fabrication of Microsystems available to the academic and industrial communities.
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